advances in lithography technology: from 55nm to 28nm, challenges facing domestic chip manufacturing
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however, in pursuit of higher precision and smaller chip size, manufacturers are facing technical challenges. among them, overlay accuracy is one of the key factors. although the overlay accuracy of domestic duv lithography machines with a resolution of 65nm has reached ≤8nm, this is only the factory standard. there will be errors in the actual processing process, and the final overlay may be lower, which will not meet the expected goals.
from a technical perspective, multiple exposure is one of the key technical means to break through the limit. double and quadruple exposure can effectively reduce overlay, achieve higher precision and smaller chip size. however, this requires the lithography machine to have higher overlay accuracy to ensure the accuracy of multiple exposure.
in contrast, the industry has seen the advantages of asml nxt:1970 (immersion duv) and nxt:1980 (immersion duv). these two lithography machines have played a key role in the mass production of 28nm process and provided chip manufacturers with higher precision and stronger production capacity. however, this also shows the difference in the development stage of industrial technology.
domestic lithography machine manufacturers are also working hard to achieve this goal. the transition from dry duv to immersion duv is an important turning point, and it is necessary to overcome technical difficulties to achieve a real breakthrough. asml launched the first mass-produced immersion duv lithography machine xt:1700i in 2006, defeating canon and nikon and occupying the leading position in the lithography machine market.
in the future, domestic lithography machine manufacturers need to continue to work hard and maintain close cooperation with international competitors to succeed in global competition. as technology continues to develop, we will see more advanced chip manufacturing technology and bring more powerful performance and application scenarios to fields such as artificial intelligence, autonomous driving and medical treatment.